Silicon chip field emission electron source fabricated by laser micromachining

The components for a silicon chip electron source were fabricated by laser micromachining using pulsed laser ablation and wet chemical cleaning and etching dips. The field emission electron source consists of a silicon field emission cathode with 4 × 4 conical shaped emitters with a height of 250 μm...

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Bibliographic details
Volume: 38
Main Author: Langer, Christoph
Bomke, Vitali
Hausladen, Matthias
Ławrowski, Robert
Prommesberger, Christian
Bachmann, Michael
Schreiner, Rupert
Format: Journal Article
Language: English
Place of publication: MELVILLE A V S AMER INST PHYSICS 01.01.2020
published in: Journal of vacuum science and technology. B, Nanotechnology & microelectronics Vol. 38; no. 1; pp. 13202 - 13210
ORCID: 0000-0001-6546-5405
0000-0002-9867-2379
0000-0003-4936-270X
Data of publication: 20200100
ISSN: 2166-2746
2166-2754
EISSN: 2166-2754
Discipline: Engineering
Physics
Subjects:
Online Access: available in Bonn?
CODEN: JVTBD9
Database: Web of Knowledge
Web of Science - Science Citation Index Expanded - 2020
Science Citation Index Expanded
Web of Science
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