Photoresist stripper compostion

A photoresist stripper composition is formed of a mixture of PGME (propylene glycol mono-methyl ether) and ANONE, and includes the compound derived from PGME and ANONE, cycloanone.

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Bibliographic details
Main Author: KUO, GUANG-LIANG
HUI, MING-AN
CAI, MU-LIN
DAI, SING-RU
Format: Patent
Language: Chinese, English
Place of publication: 16.05.2006
Related: ECHEM SOLUTIONS CORP
Data of publication: 20060516
Discipline: Medicine
Chemistry
Sciences
Physics
Bibliography: Application Number: TW20040134044
Subjects:
Online Access: available in Bonn?
Database: esp@cenet
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