Photoresist cleaning solvent

The present invention provides a photoresist cleaning solvent consisting of either propylene glycol mono-methyl ether acetate (PGMEA) or its derived compound and either cyclohexanone (ANONE) or its derived compound. The photoresist cleaning solvent has the following advantages: (1) With extremely lo...

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Bibliographic details
Main Author: KUO, KUANG-LUNG
DAI, SING-RU
Format: Patent
Language: Chinese, English
Place of publication: 16.12.2006
Related: ECHEM SOLUTIONS CORP
Data of publication: 20061216
Discipline: Medicine
Chemistry
Sciences
Physics
Bibliography: Application Number: TW20050144393
Subjects:
Online Access: available in Bonn?
Database: esp@cenet
Database information Databases - DBIS