Photo resist stripper composition

A photo resist stripper composition includes PGME or its derivatives and ANONE or its derivatives characterized by low toxicity, safe use, free of odors, environment friendly, easy disposal of waste liquid and wastewater; good solution to photo resist material film, proper volatility, excellent stri...

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Bibliographic details
Main Author: DAI SING-RU
KUO KUANG-LUNG
HSU MING-ANN
TSAI MU-LIN
Format: Patent
Language: English
Place of publication: 11.05.2006
Related: ECHEM SOLUTION CORP
Data of publication: 20060511
Discipline: Medicine
Chemistry
Sciences
Physics
Bibliography: Application Number: US20050109406
Subjects:
Online Access: available in Bonn?
Database: esp@cenet
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