Photo resist stripper composition

A photo resist stripper composition includes PGME or its derivatives and ANONE or its derivatives characterized by low toxicity, safe use, free of odors, environment friendly, easy disposal of waste liquid and wastewater; good solution to photo resist material film, proper volatility, excellent stri...

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Bibliographic details
Main Author: Hsu, Ming-Ann
Kuo, Kuang-Lung
Tsai, Mu-Lin
Dai, Sing-Ru
Format: Patent
Language: English
Place of publication: 25.11.2008
Related: Echem Solutions Corp
Data of publication: 20081125
Online Access: available in Bonn?
Database: USPTO Issued Patents
Database information Databases - DBIS