Photo resist stripper composition
A photo resist stripper composition includes PGME or its derivatives and ANONE or its derivatives characterized by low toxicity, safe use, free of odors, environment friendly, easy disposal of waste liquid and wastewater; good solution to photo resist material film, proper volatility, excellent stri...
|Place of publication:||
Echem Solutions Corp
|Data of publication:||20081125|
|Online Access:||available in Bonn?|
|Database:||USPTO Issued Patents
Database information Databases - DBIS